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ASML's High-NA EUV Tool Boosts Intel
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ASML has shipped its cutting-edge high-performance extreme ultraviolet (EUV) lithography tool with a 0.55 numerical aperture (High-NA) to Intel for its 18A fabrication process, granting Intel a competitive edge over rivals TSMC and Samsung.
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How could ASML's success in the lithography market influence its position in the broader semiconductor supply chain?
How might Intel's adoption of ASML's high-performance lithography tool impact the competitive landscape in the semiconductor industry?
What are the potential implications of ASML's advancements in lithography technology on the development of next-generation electronic devices?
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