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OverviewAPI
Chinese company SMEE claims a breakthrough in lithography technology with a 28nm-capable lithography tool, marking a significant step towards closing the technological gap in the global chip industry. However, the tool is still behind those made by market leader ASML. The announcement reflects the challenges faced by Chinese companies in acquiring advanced chip-making equipment due to U.S. export restrictions and the company being put on the Entity List by the U.S. Department of Commerce.

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