AlixLabs develops atomic layer etching technology for semiconductor manufacturing, focusing on miniaturization of electronic components.

AlixLabs

Atomic Layer Etching for Nano Device Fabrication

We provide an ALE-based method of manufacturing nanostructures with characteristic size below 20nm.

This is a new method of nanostructure fabrication using the atomic layer etching process, which is inherently a damage-free etch process. Owing to the etching process’s selectivity to inclined surfaces, which has been recently discovered, the inclined surfaces can be used as a mask and in this way walls of tapered structures, which can be readily fabricated by e.g., dry etching or epitaxial growth, will provide masking during the atomic layer etching process. This is why this process provides access to fabrication of extremely small structures in a very precise and efficient way.

Navigare Ventures

Industrifonden

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Almi Invest

Michael Nylander

Alexander Nylander

William Nylander

Awesome AlixLabs made it a second time - EETimes Silicon 100: Startups Worth Watching in 2024!
Peter Clarke Anne-Françoise Pelé Jonas Klar (鍾可樂) Silicon Saxony  Silicon Vikings  Ny Teknik Per Henricsson 

https://lnkd.in/dBYMq5h8

Ymir, AlixLabs first 300 mm APS(TM) Tool is in final assembly at Nanovac AB in Staffanstorp Sweden

♦ Ymir as the First Giant: Ymir is considered the first giant (jötunn) in Norse mythology. He is a primeval being and is the ancestor of all jötnar, the race of giants. Ymir is central to the Norse creation myth.
♦ Creation in Ginnungagap: According to the myth, Ymir was created in the void known as Ginnungagap, a vast, empty space that existed before the creation of the world. The myth explains that when the heat from Muspelheim (the realm of fire) met the cold from Niflheim (often described as a realm of ice or mist), the melting ice formed the primeval being Ymir.

A helium leak tight Ginnungagap has been confirmed - Stay tuned for the realm of fire and ice!
Thomas Engstedt

The Ångström Era an is good timing for AlixLabs! TSMC, Intel and Samsung expansion into Ångström-class fabs, particularly targeting a 14-ångström process, will significantly impact technologies like Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE). As semiconductor nodes shrink, the demand for precision at atomic scales and interfaces will drive innovations in ALD and ALE, necessitating advancements in equipment, processes and materials to handle the complexities of more litho-layers with small feature sizes and 3D device architecture like GAA-FETs and the coming CFETs. Especially scaling in interconnects and metallization is expected to physically shrink further. 
#ALDep #ALEtch #semiconductor 
https://lnkd.in/eNcUw4Cr

Slides of the opening remarks from the AVS ALD-ALE 2024 Conference session on Atomic Layer Etching (ALE). This slideshow encapsulates the key points and highlights presented during the introductory segment, setting the stage for a comprehensive exploration of the latest advancements and innovations in ALE. Presenters were ALE2024 Program Chair Fred Roozeboom and ALE2024 Program Co-chair Dmitry Suyatin.

Slides:

"#ALDALE2024 Quite the line up in the front row of the plenary session earlier today. ALD and ALE Program Chairs and Co-chairs with plenary speakers. Listening in on the ALD Innovator Awardee talk by Annelies Delabie."

From left to right:  Mikko Ritala (University of Helsinki) Markku Leskelä (University of Helsinki) Ivo Raaijmakers (ASM), Fred Roozeboom (University of Twente ) Dmitry Suyatin (AlixLabs) Tuomo Suntola - The Inventor of ALD

From Twitter: https://lnkd.in/e4FFnTqk
Heather Korff

We would like to thank AlixLabs Advisors Fred Roozeboom and Jacques Kools for their fantastic support for us at the ALD ALE 2024 Conference in Helsinki! We were also happy to have you visit us in Lund on the way home and look forward to continued success together!

Also in the photos: Asif Hassan Intu Sharma Dmitry Suyatin Reza Jafari Jam Jonas Sundqvist

We have had busy days in Helsinki presenting AlixLabs  at the AVS ALD ALE 2024. Dmitry Suyatin and Fred Roozeboom has now handed over their Chairs to the Koreans for ALE 2025 - well done Gentlemen!

 Yoana Ilarionova gave a well received presentation on RFEA in ALE and we had great support by Jacques Kools and Jonas Klar (鍾可樂)

ASML has unveiled its revolutionary Hyper-NA EUV technology, set to transform semiconductor manufacturing by enabling unprecedented levels of transistor density. Announced by former president Martin van den Brink at imec's ITF World event in Antwerp, Hyper-NA boosts the numerical aperture (NA) from 0.55 to 0.75. This advancement promises enhanced productivity, processing 400 to 500 wafers per hour, and reduces the complexity and cost of double patterning. Intel has already adopted High-NA systems, and other industry leaders are expected to follow. Hyper-NA EUV sets a new benchmark for chip design, driving efficiency, innovation, and long-term growth in the semiconductor industry.
ASML #Semiconductor #EUV #lithography
https://lnkd.in/exbHvX_a

"ASML på väg att leverera första High-NA EUV-maskinen till TSMC. Trots kritik om höga kostnader och att tekniken inte behövs i närtid väntas TSMC få en första maskin under 2024."

#halvledare
https://lnkd.in/ezQMcfv2

AlixLabs is an Atomic Layer Etching (ALE) company. ALE’s integration with EUV lithography and patterning processes enhances the precision, selectivity, and overall quality of semiconductor manufacturing. By enabling atomic-scale control and reducing defects, ALE supports the production of advanced semiconductor devices with increasingly smaller feature sizes and more complex architectures.

🔔 For a fab manufacturing a 3 nm logic node wafer, lithography and etching contribute to 45% of the total CO2 footprint - we want to change that!

🔎 For detailed insights and specific examples, check out this recent review paper in JVSTA (Open Source): https://lnkd.in/eXba7YV3

#ALEtch #Lithography #semiconductors

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