ASML's Next Chip Challenge: High NA EUV Machine

ASML is set to introduce its new $350 million 'High NA EUV' machine, crucial for maintaining its lead in the semiconductor market. The machine, utilizing extreme ultraviolet (EUV) photolithography, targets high-end semiconductor manufacturers like Intel. ASML anticipates full adoption by 2030-2031 and aims to deliver 20 units annually by 2028, excluding China due to export restrictions. The technology is expected to enhance sales, margins, and market dominance for ASML.